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Founders of Nearfield Instruments
Nearfield Instruments is a semiconductor metrology equipment company developing and delivering ground-breaking process control metrology solutions for the worldwide advanced semiconductor I.C. manufacturing industry.
Nearfield Instruments B.V. was founded in January 2016 as a spin-off of TNO.
It is difficult to imagine the modern world without electronics. Cloud computing, mobile communication, big data, to name a few, rely on the continuous rapid advancement of electronics and its core technology: interconnects, in short chips.
To achieve new functionalities and to make optimum use of the available wafer space IC devices will shrink to atomic scale dimensions using novel, sensitive materials while at the same time being designed in full three-dimensional configurations.
Since Roland van Vliet and Hamed Sadeghian founded Nearfield Instruments, the company strives to accommodate these trends in a technologically and economically viable way by developing and offering daringly innovative solutions to process control challenges in the premium nano-electronics industry.
company Timeline
MT/Sprout Challenger50
Nearfield Instruments selected as one of the 50 most challenging, innovative and fast-growing companies of the Netherlands by MT/Sprout
QUADRA deployed in HVM
QUADRA has been deployed for in-line high volume manufacturing for leading edge applications ranging from high-aspect ratio memory structures, (high-NA) EUV lithography to advanced packaging
Investment
ING Corporate Investments joins Invest-NL, Innovation Industries and TNO Tech Transfer in 27M EUR investment round
Introduction AUDIRA
Nearfield Instruments launches industry's first and only in-line, non-deestructive, subsurface metrology system.
IPCEI ME/CT partner
Nearfield Instruments, as only Dutch SME, selected as Direct Partner in multi-million Euro Important Project of Common European Interest (IPCEI) Microelectronics/Communication Technology
New Supervisory Board Chair
Eric Meurice appointed as Chair of the Supervisory Board
Investment
Nearfield Instruments receives €29 million investment from Invest-NL, Innovation Industries and Eugene
Red Herring Winner 100 Europe
Nearfield Instruments selected as one of the Red Herring Top 100 Europe business
Nearfield Instruments Korea
Nearfield Instruments establishes their Korean subsidiary
Headcount
Nearfield Instruments welcomes its 100th employee
Celebrating 5 years since foundation
After 5 years of amazing work, and after our efforts were crowned by shipping the first Quadra, Nearfield Instruments B.V. celebrated its 5th anniversary since the foundation in 2016.
First shipment of QUADRA
Nearfield Instruments B.V. announced the first shipment of QUADRA, the first-generation High-Throughput Scanning Probe Metrology system for 5 nm nodes and beyond.
Headcount
Nearfield Instruments welcomes its 75th employee
New Office
Nearfield Instruments B.V. opens a new office at High Tech Campus Eindhoven
Headcount
Nearfield Instruments welcomes its 50th employee
Investment
Second round investment with participation from Eugene Investment & Securities Co., Ltd and Scylla Technologies Inc. acting as general partners of the Eugene-Scylla NFI New Technology Business Investment Fund, and existing investors Innovation Industries and Samsung Venture Investment Corporation.
Opening Cleanroom
Official opening of Cleanroom
Headcount
Nearfield Instruments welcomes its 25th employee
Consortium participation
Start participation Nearfield Instruments in European innovation consortium project MADEin4
Relocation
Move to Rotterdam office & production hall
Investment
First round investment by Innovation Industries Fund and Samsung Venture Investment Corporation
Foundation
Nearfield Instruments B.V. was founded in Delft by Roland van Vliet and Hamed Sadeghian, in start-up portfolio of TNO Tech Transfer
Proof of Concept
World's first fully independent multiple parallel Scanning Probe Microscope realized
Concept development
TNO Nano-OptoMechatronic Instrumentation group, led by Hamed Sadeghian, start concept development on High-Throughput Scanning Probe Microscopy